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Since the first batch of commercial EUV chips came out in 2019, continuous improvements in equipment iteration, mask generation, and photoresist technology have stabilized the technology. Although the yield continues to improve, there is still a significant gap compared with the more mature deep ultraviolet (DUV) lithography. Process stability requires continuous monitoring and fine-tuning, and the high investment in power generation equipment, special equipment, and consumables makes the popula
Mar 07,2025 8